Polishing Cloth Selection Guide

Guide to selecting the right polishing cloth for your application, including PACE Technologies pad recommendations.

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Coarse / Intermediate Polishing Pads

CERMESH

(Available from PACE Technologies)

Metal mesh pad for semi-fixed abrasive coarse to intermediate lapping. Excellent for initial removal of damage from sectioning and hard materials.

Recommended: 9-15 μm diamond

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POLYPAD

Durable synthetic polyester pad ideal for intermediate polishing, especially with 6–15 μm diamond abrasives. Designed as a long-life nylon alternative.

Recommended: 6-15 μm diamond

TEXPAN

(Available from PACE Technologies)

Widely used non-woven intermediate polishing pad, compatible with most diamond suspensions. Effective across a broad range of materials.

Recommended: 3-15 μm diamond

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Black CHEM 2

(Available from PACE Technologies)

Porometric polymer pad with rubber-like consistency, offering balanced action between low and high nap pads. Ideal for moderate nap intermediate polishing.

Recommended: 3-9 μm diamond

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DACRON II

Low-napped soft polishing pad widely used in Europe for intermediate steps on metals. Suitable for 1–15 μm diamond abrasives.

Recommended: 1-15 μm diamond

NYPAD

(Available from PACE Technologies)

Low-napped silk pad tailored for intermediate polishing of harder metals and alloys. Performs well with mid-size diamond abrasives.

Recommended: 3-9 μm diamond

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GOLD PAD

(Available from PACE Technologies)

Low-napped pad ideal for 1–9 μm polishing. Designed for consistent material removal and flatness control during final pre-polishing.

Recommended: 1-9 μm diamond

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Final Polishing Pads

ATLANTIS

(Available from PACE Technologies)

Woven low-nap final polishing pad with foam backing for enhanced compliance. Ideal for 1–6 μm diamond. Great for critical surface flatness needs.

Recommended: 1-6 μm diamond

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MICROPAD

(Available from PACE Technologies)

High-napped final polishing pad ideal for producing a mirror finish on metals and polymers. Recommended for <1 μm diamond or colloidal silica.

Recommended: <1 μm diamond, colloidal silica

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TRICOTE

(Available from PACE Technologies)

Tight high-napped final polishing pad for metals. Offers better control of surface texture and minimal abrasive drag.

Recommended: <1 μm diamond

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NAPPAD

(Available from PACE Technologies)

Very high-napped final polishing pad tailored for soft metals and polymers. Provides gentle polishing action to minimize pull-out and relief.

Recommended: <1 μm diamond, soft materials

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MOLTEC 2

(Available from PACE Technologies)

Wool-based final polishing cloth used when edge retention is not critical. Works well with alumina and colloidal silica on metals.

Recommended: Colloidal silica, alumina

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FELT PAD

Thick final polishing pad made for large samples or glass. Ideal for use with colloidal silica or alumina slurries where surface uniformity is key.

Recommended: Colloidal silica, alumina

Selection Guidelines

  • Hard materials: Use harder pads (CERMESH, TEXPAN) for initial steps
  • Soft materials: Use softer pads (NAPPAD, MICROPAD) to minimize relief
  • Final polishing: Use high-nap pads (MICROPAD, TRICOTE) for mirror finish

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Browse our complete selection of PACE Technologies polishing pads, available in multiple sizes and backing options.

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Need More Help?

Use our Polishing Time Calculator or check out our comprehensive polishing methods guide.